The unique 193 nanometer wavelengthoutput of argon fluoride excimer lasers has enabled numerous advanced applications:
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Photolithography – ArF lasers are critical in semiconductor chip manufacturing to pattern small features.
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Laser surgery – The 193nm light can ablate biological tissue with precision.
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UV curing – The high photon energy allows ArF lasers to initiate polymerization in resins.
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Laser processing – ArF lasers can selectively ablate very fine details into plastics and other materials.
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Spectroscopy – The short wavelength can induce fluorescence for analyzing organic compounds.
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Optical sensing – ArF lasers interrogate photonic crystal structures used in chemical detectors.
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Photochemistry – ArF pulsed lasers drive highly selective bond breaking photoreactions.
With refinements in excimer laser technology, many additional micromachining and photochemical uses for argon fluoride systems continue emerging.
Post time: Nov-02-2023