The company's technology and products have reached advanced levels at home and abroad.

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Mainly engaged in electronic gas, organic gas,rare gas and other high purity gas,professional customized mixed gas and standard gas for various industries, while providing related gas equipment and engineering installation
Our company has 10 years experience in import and export of hazardous cargo gas product, and is engaged in the gas industry for 23 years of senior technical staff to build.
Located in Wuchang, Hubei Newradar Electronic Gas Co., Ltd, operating under the brand name Newradar Gas, is the only private company in Central China specialising in the export and operation of specialty gases. With a focus on quality and customer satisfaction, we provide a wide range of specialty gases for various industries and applications.
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Newradar is now





Founded in 2007, Newradar is now one of the largest gas manufacturers in china
Sulfur dioxide (SO2) is a colorless, pungent, poisonous gas — CAS 7446-09-5, UN1079 — that is easily liquefied and serves two very different, strictly regulated roles: food and beverage preservation as additive E220 where national rules permit it, and industrial chemistry such as sulfuric acid pr...
View moreAn excimer laser “gas refill” is not a top-up of a tank — it is a precision halogen-containing mixture (ArF 193 nm, KrF 248 nm, XeCl 308 nm, XeF 450–520 nm) that expires when the halogen donor is consumed and impurities accumulate — long before the cylinder is empty. So lifetime manag...
In semiconductor manufacturing, silane (SiH4) and germane (GeH4) are the deposition gases that grow silicon and silicon-germanium layers, while boron trichloride (BCl3) and nitrogen trifluoride (NF3) dominate the etch and clean side – BCl3 for aluminum metal etch and boron doping, NF3 for i...
For dielectric plasma etching, the gas choice usually comes down to four fluorocarbons: CF₄ (carbon tetrafluoride, R-14) as the general-purpose oxide and dielectric etch gas, C₂F₆ (hexafluoroethane, R-116) for dielectric etch and chamber-cleaning duties, C₄F₈ (octafluorocyclobutane) for high-aspe...