In summary, the unique properties of excimer laser media like ArF and KrF that enable precise, small-scale material processing at short wavelengths will remain critical for next-generation photonic technologies through the foreseeable future. Realizing their full potential will require:
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Investment in EUV and excimer innovation to advance lithography.
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Strategic partnerships between gas suppliers, laser manufacturers and end users.
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Increasing gas recycling and recovery to control costs.
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Improved supply diversity for stability and price hedging.
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Focus on reducing environmental impacts.
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Promoting safety, efficiency and design improvements.
With diligent research, responsible practices, and collaboration, excimer laser gases will keep providing specialized benefits that transform microelectronics, medicine, scientific understanding and industrial capabilities.
Post time: Nov-21-2023