Trifluoromethane, a compound that we may not often hear about in our daily lives, actually has a wide range of applications and important roles. Also known as fluoroform and Freon-23, its English name is trifluoromethane, molecular formula is CHF3 and molecular weight is 70.0138. This compound has unique chemical properties and has indispensable applications in many fields.
Firstly, trifluoromethane is an important solvent for supercritical extraction. Supercritical extraction is a technique that utilises the special properties of substances in a supercritical state for separation and extraction, and trifluoromethane is an ideal solvent for this process. Its unique solvency capacity and stability make it far more efficient than traditional methods in the extraction process, greatly improving production efficiency and product quality.
In addition, HFC-23 is an excellent low-temperature refrigerant. Due to its low boiling point and high thermal stability, HFC-23 can still maintain good refrigeration effect in low temperature environment, which is widely used in scientific research experiments, medical equipments and other occasions requiring low temperature environment.
Meanwhile, HFC-23 is also an important fire extinguishing agent. Its incombustibility and chemical stability enable it to effectively inhibit the spread of flame in the fire extinguishing process and reduce the loss caused by fire. In addition, compared with traditional extinguishing agents, HFC-23 has less impact on the environment and is more in line with the environmental protection requirements of modern society.
In industrial production, HFC-23 is also an important raw material for the manufacture of tetrafluoroethylene. Tetrafluoroethylene is an important raw material widely used in chemical, electronic, textile and other fields, as a key raw material in the production process, its quality and supply stability directly affect the production efficiency and product quality of tetrafluoroethylene.
HFC-23 plays an irreplaceable role in the electronic industry. As a plasma chemical etchant, trifluoromethane is widely used in microelectronics industry. Especially in the etching process of silicon dioxide film, trifluoromethane has become an indispensable and important raw material for microelectronics industry with its advantages of fast etching speed and good selectivity.
Post time: Apr-10-2024