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The lasing action in argon fluoride excimer lasers arises through the following process: Electric discharge passes through the Ar/F2 gas mix, creating Ar+ ions and electrons. Accelerated electrons collide with and excite argon atoms. Excited argon atoms Ar* react with fluorine molecules to form the excimer ArF* in an excited st...
View MoreArgon fluoride (ArF) is an excimer gas mixture used widely in deep ultraviolet excimer lasers. The term ‘excimer’ refers to the excited dimer state formed temporarily between an inert noble gas and a reactive halogen component. Some key properties: Composition – Typically contains 0.1% F2 and 99.9% argon ...
View MoreOwing to its hazards, boron trifluoride gas is never isolated in nature, but is produced industrially from various BF3-containing precursors. There are two main production routes: Fluorination of Boron Oxides – Boron oxide reacts with anhydrous hydrogen fluoride at 250-500°C to replace oxygen with fluorine. Various boron oxid...
View MoreBoron trifluoride is notable for its strong Lewis acidity which makes it highly reactive with compounds having lone electron pairs. This property allows BF3 to serve several industrial chemical roles: Fluorination agent – BF3 assists in replacing C-H bonds with C-F bonds in organic precursor compounds. This fluorination produc...
View MoreBoron trifluoride, with the chemical formula BF3, is an inorganic boron compound consisting of boron bound to three fluorine atoms in a trigonal planar molecular geometry. Here are some key properties of this colorless gas: At standard temperature and pressure, BF3 is a non-flammable diatomic gas. It condenses to a liquid at -100°C...
View MoreWhile carbon tetrafluoride has well-established uses as a dielectric gas and plasma etchant, emerging applications continue to take advantage of its unique properties: precursor for fluoropolymer synthesis – CF4 plasma aids deposition of protective fluorocarbon polymer films and powders nuclear fuel conversion – CF4 ca...
View MoreCarbon tetrafluoride is a completely anthropogenic compound that does not occur naturally. There are two primary industrial synthesis routes to producing CF4: Direct Fluorination – This involves reacting elemental carbon with excess elemental fluorine gas at high temperatures of 300-400°C. It directly replaces all hydrogen atoms i...
View MoreWhile highly useful industrially, carbon tetrafluoride has some negative environmental and health attributes that must be considered responsibly: In its normal gaseous form, CF4 poses little acute toxicity hazard for humans. However, in confined spaces it acts as a simple asphyxiant by displacing breathable oxygen. Long-ter...
View MoreSome of carbon tetrafluoride’s most useful attributes relate to its electric and dielectric characteristics. When subjected to strong electrical fields, CF4 decomposes to release highly reactive fluoride ions and electrons. In addition to etching applications, carbon tetrafluoride also assists with thin film depositions in semi...
View MoreCarbon tetrafluoride, with the chemical formula CF4, is an inorganic fluorocarbon gas. It has a tetrahedral molecular geometry consisting of a central carbon atom surrounded by four fluorine atoms. Here are some of the notable physical and chemical properties of CF4: Carbon tetrafluoride (CF4) has become an essential gas for the...
View MoreIntroduction: Tetrafluoromethane (CF4), a colorless and odorless gas, has become a cornerstone in the electronics industry due to its exceptional properties and diverse applications. In this article, we will explore the significant role of CF4 in electronics and its contributions to the advancement of various electronic devices and technologie...
View MoreWith growing adoption of energy efficient construction and lighting, along with maturing excimer laser technologies, the specialized applications for krypton gas look set to expand further: Lighting – Greater LED lighting efficiency may enable more exotic krypton lamps and tubes. Windows – Stricter building cod...
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