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Future Outlook for Argon Fluoride Excimer Lasers

 

    First developed in the 1970s, argon fluoride excimer lasers continue to take on expanding roles given their unique 193 nanometer wavelength output. What does the future hold for ArF technology?

 

  • Next-generation lithography – ArF lasers are expected to enable further miniaturization down to sub-10 nanometer node semiconductor fabrication.

  • Improved pulse control – Advances in pulse modulation and shaping will lead to greater processing precision for delicate materials.

  • Higher average powers – New gas chamber designs will allow higher repetition rates and average beam power.

  • Table-top systems – More compact and affordable ArF laser units will lead to wider adoption beyond specialized facilities.

  • Novel applications – The 193nm wavelength has potential uses in sterilization, fluorescence studies, nanosurgery, and 3D printing.

  • Gas recycling – Closed-loop recovery and cleaning of ArF gas mixtures will make operation more economical and eco-friendly.

    Even after over 40 years of development, the innovative excimer laser medium of argon fluoride continues providing a deep ultraviolet light source enabling the production of ever-smaller and more powerful microelectronics into the foreseeable future.


Post time: Sep-14-2023