While carbon tetrafluoride has well-established uses as a dielectric gas and plasma etchant, emerging applications continue to take advantage of its unique properties:
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precursor for fluoropolymer synthesis – CF4 plasma aids deposition of protective fluorocarbon polymer films and powders
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nuclear fuel conversion – CF4 can produce uranium hexafluoride for uranium enrichment
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semiconductor cleaning – CF4 plasma removes silicon dioxide and photoresist residues
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tracer gas – used to detect leaks and flow patterns at very low concentrations
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lense surface modification – CF4 treatment improves optical lens hydrophobicity
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particle accelerator cooling – excellent heat capacity suits CF4 for cooling superconducting sections
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negative ion beams – injection of CF4 into duoplasmatrons enhances negative ion current output
The extreme chemical stability combined with the readily dissociated nature of CF4 provides a versatile combination that researchers continue finding new applications for across scientific and industrial fields.
Post time: Oct-24-2023